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Technology for defectivity improvement in resist coating and developing process in EUV lithography process

dc.contributor.authorKamei, Yuya
dc.contributor.authorShiozawa, Takahiro
dc.contributor.authorKawakami, Shinichiro
dc.contributor.authorShite, Hideo
dc.contributor.authorIchinomiya, Hiroshi
dc.contributor.authorEnomoto, Masashi
dc.contributor.authorNafus, Kathleen
dc.contributor.authorDemand, Marc
dc.contributor.authorFoubert, Philippe
dc.date.accessioned2021-10-24T06:35:56Z
dc.date.available2021-10-24T06:35:56Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28635
dc.sourceIIOimport
dc.titleTechnology for defectivity improvement in resist coating and developing process in EUV lithography process
dc.typeProceedings paper
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorDemand, Marc
dc.contributor.imecauthorFoubert, Philippe
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1014326
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=2615277
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10143


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