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Plasma immersion ion implantation for shallow junctions in silicon

dc.contributor.authorPinter, Istvan
dc.contributor.authorAbdulhadi, A.
dc.contributor.authorMakaro, Z.
dc.contributor.authorKhanh, N.
dc.contributor.authorAdam, M.
dc.contributor.authorBarsony, I.
dc.contributor.authorSivoththaman, Sivanarayanamoorthy
dc.contributor.authorPoortmans, Jef
dc.contributor.authorSong, H.
dc.contributor.authorAdriaenssens, G.
dc.date.accessioned2021-10-01T08:41:31Z
dc.date.available2021-10-01T08:41:31Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2867
dc.sourceIIOimport
dc.titlePlasma immersion ion implantation for shallow junctions in silicon
dc.typeOral presentation
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewno
dc.source.conferenceE-MRS 1998 Spring Meeting; 16-19 June 1998; Strasbourg, France.
dc.source.conferencelocation
imec.availabilityPublished - imec
imec.internalnotes


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