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EUV single patterning for logic metal layers: achievement and challenge

dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorGillijns, Werner
dc.contributor.authorDrissi, Youssef
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorBlanco, Victor
dc.contributor.authorLariviere, Stephane
dc.contributor.authorDe Ruyter, Rudi
dc.contributor.authorDehan, Morin
dc.contributor.authorMcIntyre, Greg
dc.contributor.authorTan, Ling Ee
dc.date.accessioned2021-10-24T06:56:23Z
dc.date.available2021-10-24T06:56:23Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28683
dc.sourceIIOimport
dc.titleEUV single patterning for logic metal layers: achievement and challenge
dc.typeProceedings paper
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorDrissi, Youssef
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorLariviere, Stephane
dc.contributor.imecauthorDe Ruyter, Rudi
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecBlanco, Victor::0000-0003-4308-0381
dc.contributor.orcidimecDe Ruyter, Rudi::0000-0002-8145-288X
dc.source.peerreviewyes
dc.source.beginpage1045004
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography
dc.source.conferencedate17/09/2017
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttps://www.spiedigitallibrary.org/conference-proceedings-of-spie/10450/1045004/EUV-single-patterning-for-logic-metal-layers--ac
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10450


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