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dc.contributor.authorKim, Ryan Ryoung han
dc.contributor.authorRyckaert, Julien
dc.contributor.authorRaghavan, Praveen
dc.contributor.authorSherazi, Yasser
dc.contributor.authorDebacker, Peter
dc.contributor.authorTrivkovic, Darko
dc.contributor.authorGillijns, Werner
dc.contributor.authorTan, Ling Ee
dc.contributor.authorDrissi, Youssef
dc.contributor.authorBlanco, Victor
dc.contributor.authorBekaert, Joost
dc.contributor.authorMao, Ming
dc.contributor.authorLariviere, Stephane
dc.contributor.authorMcIntyre, Greg
dc.date.accessioned2021-10-24T06:56:55Z
dc.date.available2021-10-24T06:56:55Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28684
dc.sourceIIOimport
dc.titleDesign and pitch scaling for affordable node transition and EUV insertion scenario
dc.typeProceedings paper
dc.contributor.imecauthorKim, Ryan Ryoung han
dc.contributor.imecauthorRyckaert, Julien
dc.contributor.imecauthorSherazi, Yasser
dc.contributor.imecauthorDebacker, Peter
dc.contributor.imecauthorTrivkovic, Darko
dc.contributor.imecauthorGillijns, Werner
dc.contributor.imecauthorTan, Ling Ee
dc.contributor.imecauthorDrissi, Youssef
dc.contributor.imecauthorBlanco, Victor
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorMao, Ming
dc.contributor.imecauthorLariviere, Stephane
dc.contributor.orcidimecDebacker, Peter::0000-0003-3825-5554
dc.contributor.orcidimecGillijns, Werner::0000-0002-2430-7360
dc.contributor.orcidimecTan, Ling Ee::0000-0002-3143-5176
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2257885
dc.source.peerreviewyes
dc.source.beginpage101480V
dc.source.conferenceDesign-Process-Technology Co-optimization for Manufacturability XI
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10148


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