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In-line metrology for atomic resolution local height variation

dc.contributor.authorKim, Tae-Gon
dc.contributor.authorKim, Soon-Wook
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorJo, Ah-jin
dc.contributor.authorLee, Ju Suk
dc.contributor.authorAhn, Byoung-Woon
dc.contributor.authorZandiatashbar, Ardavan
dc.contributor.authorCho, Sang-Joon
dc.contributor.authorPark, Sang-il
dc.contributor.authorIrmer, Bernd
dc.contributor.authorSchmidt, Sebastian
dc.date.accessioned2021-10-24T06:57:52Z
dc.date.available2021-10-24T06:57:52Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28686
dc.sourceIIOimport
dc.titleIn-line metrology for atomic resolution local height variation
dc.typeProceedings paper
dc.contributor.imecauthorKim, Soon-Wook
dc.contributor.imecauthorVandeweyer, Tom
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage267
dc.source.endpage272
dc.source.conference28th Annual SEMI Advanced Semiconductor Manufacturing Conference - ASMC
dc.source.conferencedate15/05/2017
dc.source.conferencelocationSaratoga Springs, NY US
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7969242/
imec.availabilityPublished - open access


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