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In-line 3D AFM for critical dimension and sidewall roughness of Si photonic waveguide and correlation with its propagation loss

dc.contributor.authorKim, Tae-Gon
dc.contributor.authorVerheyen, Peter
dc.contributor.authorDe Heyn, Peter
dc.contributor.authorVandeweyer, Tom
dc.contributor.authorMiller, Andy
dc.contributor.authorPantouvaki, Marianna
dc.contributor.authorVan Campenhout, Joris
dc.contributor.authorJo, Ahjin
dc.contributor.authorCho, Sangjoon
dc.contributor.authorPark, Sang-il
dc.date.accessioned2021-10-24T06:58:21Z
dc.date.available2021-10-24T06:58:21Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28687
dc.sourceIIOimport
dc.titleIn-line 3D AFM for critical dimension and sidewall roughness of Si photonic waveguide and correlation with its propagation loss
dc.typeOral presentation
dc.contributor.imecauthorVerheyen, Peter
dc.contributor.imecauthorDe Heyn, Peter
dc.contributor.imecauthorVandeweyer, Tom
dc.contributor.imecauthorMiller, Andy
dc.contributor.imecauthorPantouvaki, Marianna
dc.contributor.imecauthorVan Campenhout, Joris
dc.contributor.orcidimecDe Heyn, Peter::0000-0003-3523-7377
dc.contributor.orcidimecVan Campenhout, Joris::0000-0003-0778-2669
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conferenceInternational Conference on Frontiers of Characterization and Metrology for Nanoelectronics - FCMN
dc.source.conferencedate21/03/2016
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttps://www.nist.gov/pml/engineering-physics-division/2017-fcmn-presentations
imec.availabilityPublished - open access
imec.internalnotesPoster 028


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