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Study of SiGe cleaning

dc.contributor.authorKomori, Kana
dc.contributor.authorWostyn, Kurt
dc.contributor.authorRondas, Dirk
dc.contributor.authorLoyo Prado, Jana
dc.contributor.authorConard, Thierry
dc.contributor.authorLoo, Roger
dc.contributor.authorRagnarsson, Lars-Ake
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-24T07:04:12Z
dc.date.available2021-10-24T07:04:12Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28700
dc.sourceIIOimport
dc.titleStudy of SiGe cleaning
dc.typeProceedings paper
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorRondas, Dirk
dc.contributor.imecauthorLoyo Prado, Jana
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorRagnarsson, Lars-Ake
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecRagnarsson, Lars-Ake::0000-0003-1057-8140
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.identifier.doi10.1149/08002.0141ecst
dc.source.peerreviewyes
dc.source.beginpage141
dc.source.endpage146
dc.source.conference232nd ECS Meeting: 15th International Symposium on Semiconductor Cleaning and Technology - SCST15
dc.source.conferencedate1/10/2017
dc.source.conferencelocationNational Harbor, MD USA
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol 80, Issue 2


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