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Etch residue formation and growth on patterned porous dielectrics: angle-resolved XPS and Infrared characterization

dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-24T07:35:16Z
dc.date.available2021-10-24T07:35:16Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28771
dc.sourceIIOimport
dc.titleEtch residue formation and growth on patterned porous dielectrics: angle-resolved XPS and Infrared characterization
dc.typeMeeting abstract
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.source.peerreviewyes
dc.source.conferenceAVS 64th International Symposium
dc.source.conferencedate29/10/2017
dc.source.conferencelocationTampa, FL USA
imec.availabilityPublished - imec


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