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Electromigration threshold in damascene versus plasma-etched interconnects
Publication:
Electromigration threshold in damascene versus plasma-etched interconnects
Date
1998
Journal article
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2756.pdf
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Proost, Joris
;
Maex, Karen
;
Delaey, L.
Journal
Applied Physics Letters
Abstract
Description
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1907
since deposited on 2021-10-01
Acq. date: 2025-10-23
Citations
Metrics
Views
1907
since deposited on 2021-10-01
Acq. date: 2025-10-23
Citations