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dc.contributor.authorLoo, Roger
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorCott, Daire
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorPourtois, Geoffrey
dc.contributor.authorSchulze, Andreas
dc.contributor.authorDouhard, Bastien
dc.contributor.authorVanherle, Wendy
dc.contributor.authorRichard, Olivier
dc.contributor.authorFavia, Paola
dc.contributor.authorEneman, Geert
dc.contributor.authorMitard, Jerome
dc.contributor.authorCollaert, Nadine
dc.date.accessioned2021-10-24T08:13:10Z
dc.date.available2021-10-24T08:13:10Z
dc.date.issued2017-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28852
dc.sourceIIOimport
dc.titleEpitaxial CVD growth of ultra-thin Si passivation layers on strained Ge FIN structures
dc.typeMeeting abstract
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorCott, Daire
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorPourtois, Geoffrey
dc.contributor.imecauthorDouhard, Bastien
dc.contributor.imecauthorVanherle, Wendy
dc.contributor.imecauthorRichard, Olivier
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecPourtois, Geoffrey::0000-0003-2597-8534
dc.contributor.orcidimecRichard, Olivier::0000-0002-3994-8021
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.source.peerreviewyes
dc.source.beginpage1150
dc.source.conference232nd Electrochemical Society Fall Meeting, Symposium: Semiconductor Process Integration 10
dc.source.conferencedate1/10/2017
dc.source.conferencelocationNational Harbor, MD USA
dc.identifier.urlhttps://ecs.confex.com/ecs/232/webprogram/Paper102012.html
imec.availabilityPublished - imec
imec.internalnotesECS Meeting Abstracts; Vol. 2012-02


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