Electromigration-induced drift in damascene vs. conventional interconnects: an intrinsic difference
dc.contributor.author | Proost, Joris | |
dc.contributor.author | Samajdar, I. | |
dc.contributor.author | Witvrouw, Ann | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-01T08:44:37Z | |
dc.date.available | 2021-10-01T08:44:37Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2887 | |
dc.source | IIOimport | |
dc.title | Electromigration-induced drift in damascene vs. conventional interconnects: an intrinsic difference | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Maex, Karen | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | no | |
dc.source.beginpage | 89 | |
dc.source.endpage | 94 | |
dc.source.conference | Materials Reliability in Microelectronics VIII | |
dc.source.conferencedate | 13/04/1998 | |
dc.source.conferencelocation | San Francisco, CA USA | |
imec.availability | Published - open access | |
imec.internalnotes | MRS Symposium Proceedings; Vol. 516 |