Lithographic strategies for 0.35µm poly gates for random logic applications

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Authors
Op de Beeck, Maaike; Van Driessche, Veerle; Van den hove, Luc; Dijkstra, H.
Conference
Advances in Resist Technology and Processing XI
Title
Lithographic strategies for 0.35µm poly gates for random logic applications
Publication type
Proceedings paper
Embargo date
9999-12-31
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