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Spin on metal oxide materials for N7 and beyond patterning applications

dc.contributor.authorMannaert, Geert
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorHopf, Toby
dc.contributor.authorSebaai, Farid
dc.contributor.authorLorant, Christophe
dc.contributor.authorPetermann, Claire
dc.contributor.authorHong, S-E
dc.contributor.authorMullen, S
dc.contributor.authorWolfer, E
dc.contributor.authorMckenzie, D
dc.contributor.authorYao, H
dc.contributor.authorRahman, D
dc.contributor.authorCho, J-Y
dc.contributor.authorPadmanaban, M
dc.contributor.authorPiumi, Daniele
dc.date.accessioned2021-10-24T08:42:34Z
dc.date.available2021-10-24T08:42:34Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28911
dc.sourceIIOimport
dc.titleSpin on metal oxide materials for N7 and beyond patterning applications
dc.typeProceedings paper
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorHopf, Toby
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorLorant, Christophe
dc.contributor.imecauthorPetermann, Claire
dc.contributor.imecauthorPiumi, Daniele
dc.contributor.orcidimecLorant, Christophe::0000-0001-7363-9348
dc.source.peerreviewyes
dc.source.beginpage101490T
dc.source.conferenceAdvanced Etch Technology for Nanopatterning VI
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://dx.doi.org/10.1117/12.2264323
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10149


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