Show simple item record

Co-optimization of lithographic and patterning processes for improved EPE performance

dc.contributor.authorMaslow, Mark
dc.contributor.authorTimoshkov, Vadim
dc.contributor.authorKiers, Ton
dc.contributor.authorJee, Tae Kwon
dc.contributor.authorde Loijer, Peter
dc.contributor.authorMorikita, Shinya
dc.contributor.authorDemand, Mark
dc.contributor.authorMetz, Andrew W
dc.contributor.authorOkada, Soichiro
dc.contributor.authorKumar, Kaushik A.
dc.contributor.authorBiesemans, Serge
dc.contributor.authorYaegashi, Hidetami
dc.contributor.authorDi Lorenzo, Paolo
dc.contributor.authorBekaert, Joost
dc.contributor.authorMao, Ming
dc.contributor.authorBeral, Christophe
dc.contributor.authorLariviere, Stephane
dc.date.accessioned2021-10-24T08:57:38Z
dc.date.available2021-10-24T08:57:38Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/28942
dc.sourceIIOimport
dc.titleCo-optimization of lithographic and patterning processes for improved EPE performance
dc.typeProceedings paper
dc.contributor.imecauthorBiesemans, Serge
dc.contributor.imecauthorBekaert, Joost
dc.contributor.imecauthorMao, Ming
dc.contributor.imecauthorBeral, Christophe
dc.contributor.imecauthorLariviere, Stephane
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.contributor.orcidimecBeral, Christophe::0000-0003-1356-9186
dc.source.peerreviewyes
dc.source.beginpage101490N
dc.source.conferenceAdvanced Etch Technology for Nanopatterning VI
dc.source.conferencedate27/02/2017
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://spie.org/Publications/Proceedings/Paper/10.1117/12.2257979
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 10149


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record