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Development of an electroless copper deposition bath for via fill applications on TiN seed layers
Publication:
Development of an electroless copper deposition bath for via fill applications on TiN seed layers
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Date
1994
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Palmans, Roger
;
Maex, Karen
Journal
Abstract
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2106
since deposited on 2021-09-29
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Acq. date: 2025-12-09
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Metrics
Views
2106
since deposited on 2021-09-29
3
last month
1
last week
Acq. date: 2025-12-09
Citations