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dc.contributor.authorOhashi, Takeyoshi
dc.contributor.authorYamaguchi, Atsuko
dc.contributor.authorHasumi, Kazuhisa
dc.contributor.authorInoue, Osamu
dc.contributor.authorIkota, Masami
dc.contributor.authorLorusso, Gian
dc.contributor.authorDonadio, Gabriele Luca
dc.contributor.authorYasin, Farrukh
dc.contributor.authorRao, Siddharth
dc.contributor.authorKar, Gouri Sankar
dc.date.accessioned2021-10-24T10:21:48Z
dc.date.available2021-10-24T10:21:48Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29104
dc.sourceIIOimport
dc.titleVariability study with CD-SEM metrology for STT-MRAM: correlation analysis between physical dimensions and electrical property of the memory element
dc.typeProceedings paper
dc.contributor.imecauthorLorusso, Gian
dc.contributor.imecauthorDonadio, Gabriele Luca
dc.contributor.imecauthorYasin, Farrukh
dc.contributor.imecauthorRao, Siddharth
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.orcidimecYasin, Farrukh::0000-0002-7295-0254
dc.contributor.orcidimecRao, Siddharth::0000-0001-6161-3052
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2257908
dc.source.peerreviewyes
dc.source.beginpage101450H
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXXI
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10145


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