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Novel membrane solutions for the EUV pellicle : better or not ?

dc.contributor.authorPollentier, Ivan
dc.contributor.authorLee, Jae Uk
dc.contributor.authorTimmermans, Marina
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorZahedmanesh, Houman
dc.contributor.authorHuyghebaert, Cedric
dc.contributor.authorGallagher, Emily
dc.date.accessioned2021-10-24T11:15:39Z
dc.date.available2021-10-24T11:15:39Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29202
dc.sourceIIOimport
dc.titleNovel membrane solutions for the EUV pellicle : better or not ?
dc.typeProceedings paper
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorLee, Jae Uk
dc.contributor.imecauthorTimmermans, Marina
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorZahedmanesh, Houman
dc.contributor.imecauthorHuyghebaert, Cedric
dc.contributor.imecauthorGallagher, Emily
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecLee, Jae Uk::0000-0002-9434-5055
dc.contributor.orcidimecTimmermans, Marina::0000-0001-9805-8259
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecHuyghebaert, Cedric::0000-0001-6043-7130
dc.contributor.orcidimecGallagher, Emily::0000-0002-2927-8298
dc.date.embargo9999-12-31
dc.identifier.doi10.1117/12.2257891
dc.source.peerreviewyes
dc.source.beginpage101430L
dc.source.conferenceExtreme Ultraviolet (EUV) Lithography VIII
dc.source.conferencedate26/02/2017
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10143


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