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Role of UV/chlorine exposure during dry surface conditioning before integrated epi deposition process

dc.contributor.authorRuzyllo, Jerzy
dc.contributor.authorRöhr, Erika
dc.contributor.authorBaeyens, Martien
dc.contributor.authorConard, Thierry
dc.contributor.authorMertens, Paul
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-01T08:50:44Z
dc.date.available2021-10-01T08:50:44Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2921
dc.sourceIIOimport
dc.titleRole of UV/chlorine exposure during dry surface conditioning before integrated epi deposition process
dc.typeOral presentation
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.source.peerreviewno
dc.source.conference4th International Symposium on Ultra Clean Processing of Silicon Surfaces - UCPSS
dc.source.conferencedate21/09/1998
dc.source.conferencelocationOostende belgium
imec.availabilityPublished - imec
imec.internalnotesPubl. in 1999; Zie C3756


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