dc.contributor.author | Rassoul, Nouredine | |
dc.contributor.author | Jourdain, Anne | |
dc.contributor.author | Tutunjyan, Nina | |
dc.contributor.author | De Vos, Joeri | |
dc.contributor.author | Sardo, Stefano | |
dc.contributor.author | Inoue, Fumihiro | |
dc.contributor.author | Piumi, Daniele | |
dc.contributor.author | Miller, Andy | |
dc.contributor.author | Beyne, Eric | |
dc.contributor.author | Walsby, Edward | |
dc.contributor.author | Jash Patel, Patel | |
dc.contributor.author | Oliver, Ansell | |
dc.contributor.author | Huma, Ashraf | |
dc.contributor.author | Janet, Hopkins | |
dc.contributor.author | Dave, Thomas | |
dc.date.accessioned | 2021-10-24T11:55:21Z | |
dc.date.available | 2021-10-24T11:55:21Z | |
dc.date.issued | 2017 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/29271 | |
dc.source | IIOimport | |
dc.title | RIE dynamics for extreme wafer thinning applications | |
dc.type | Meeting abstract | |
dc.contributor.imecauthor | Rassoul, Nouredine | |
dc.contributor.imecauthor | Jourdain, Anne | |
dc.contributor.imecauthor | Tutunjyan, Nina | |
dc.contributor.imecauthor | De Vos, Joeri | |
dc.contributor.imecauthor | Sardo, Stefano | |
dc.contributor.imecauthor | Inoue, Fumihiro | |
dc.contributor.imecauthor | Piumi, Daniele | |
dc.contributor.imecauthor | Miller, Andy | |
dc.contributor.imecauthor | Beyne, Eric | |
dc.contributor.imecauthor | Walsby, Edward | |
dc.contributor.orcidimec | Rassoul, Nouredine::0000-0001-9489-3396 | |
dc.contributor.orcidimec | De Vos, Joeri::0000-0002-9332-9336 | |
dc.contributor.orcidimec | Sardo, Stefano::0000-0002-9302-8007 | |
dc.contributor.orcidimec | Beyne, Eric::0000-0002-3096-050X | |
dc.source.peerreview | no | |
dc.source.conference | PESM | |
dc.source.conferencedate | 20/10/2017 | |
dc.source.conferencelocation | Leuven Belgium | |
imec.availability | Published - imec | |