RIE dynamics for extreme wafer thinning applications

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Authors
Rassoul, Nouredine; Jourdain, Anne; Tutunjyan, Nina; De Vos, Joeri; Sardo, Stefano; Inoue, Fumihiro; Piumi, Daniele; Miller, Andy; Beyne, Eric; Walsby, Edward; Jash Patel, Patel; Oliver, Ansell; Huma, Ashraf; Janet, Hopkins; Dave, Thomas
Conference
PESM
Title
RIE dynamics for extreme wafer thinning applications
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