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Strain and composition monitoring in various (Si)Ge fin structures using in-line HRXRD

dc.contributor.authorSchulze, Andreas
dc.contributor.authorLoo, Roger
dc.contributor.authorWitters, Liesbeth
dc.contributor.authorMertens, Hans
dc.contributor.authorCollaert, Nadine
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorWormington, Matthew
dc.contributor.authorRyan, Paul
dc.contributor.authorVandervorst, Wilfried
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-24T13:10:52Z
dc.date.available2021-10-24T13:10:52Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29401
dc.sourceIIOimport
dc.titleStrain and composition monitoring in various (Si)Ge fin structures using in-line HRXRD
dc.typeMeeting abstract
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorMertens, Hans
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.source.peerreviewyes
dc.source.conferenceFrontiers of Characterization and Metrology for Nanoelectronics - FCMN
dc.source.conferencedate21/03/2017
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec


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