Impact of the metal gate on the oxide stack quality assessed by low-frequency noise

Thumbnail
View/open
Metadata
Show full item record
Authors
Simoen, Eddy; He, Liang; O'Sullivan, Barry; Veloso, Anabela; Horiguchi, Naoto; Collaert, Nadine; Claeys, Cor
Conference
232nd ECS Fall Meeting - Semiconductor Process Integration 10
Title
Impact of the metal gate on the oxide stack quality assessed by low-frequency noise
Publication type
Proceedings paper
Embargo date
9999-12-31
Collections