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Impact of the metal gate on the oxide stack quality assessed by low-frequency noise

dc.contributor.authorSimoen, Eddy
dc.contributor.authorHe, Liang
dc.contributor.authorO'Sullivan, Barry
dc.contributor.authorVeloso, Anabela
dc.contributor.authorHoriguchi, Naoto
dc.contributor.authorCollaert, Nadine
dc.contributor.authorClaeys, Cor
dc.date.accessioned2021-10-24T13:34:25Z
dc.date.available2021-10-24T13:34:25Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29439
dc.sourceIIOimport
dc.titleImpact of the metal gate on the oxide stack quality assessed by low-frequency noise
dc.typeProceedings paper
dc.contributor.imecauthorSimoen, Eddy
dc.contributor.imecauthorO'Sullivan, Barry
dc.contributor.imecauthorVeloso, Anabela
dc.contributor.imecauthorHoriguchi, Naoto
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecSimoen, Eddy::0000-0002-5218-4046
dc.contributor.orcidimecO'Sullivan, Barry::0000-0002-9036-8241
dc.contributor.orcidimecHoriguchi, Naoto::0000-0001-5490-0416
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage69
dc.source.endpage80
dc.source.conference232nd ECS Fall Meeting - Semiconductor Process Integration 10
dc.source.conferencedate1/10/2017
dc.source.conferencelocationNational Harbor, MD USA
dc.identifier.urlhttp://ecst.ecsdl.org/content/80/4/69.abstract
imec.availabilityPublished - open access
imec.internalnotesECS Transactions; Vol. 80, Issue 4


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