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Substrate dependence of ruthenium atomic layer deposition

dc.contributor.authorSoethoudt, Job
dc.contributor.authorTomczak, Yoann
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorKrishtab, Mikhail
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-24T13:54:50Z
dc.date.available2021-10-24T13:54:50Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29472
dc.sourceIIOimport
dc.titleSubstrate dependence of ruthenium atomic layer deposition
dc.typeMeeting abstract
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorKrishtab, Mikhail
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.conference2nd Area Selective Deposition Workshop - ASD
dc.source.conferencedate20/02/2017
dc.source.conferencelocationEindhoven The Netherlands
dc.identifier.urlhttp://www.nanomanufacturing.nl/ASD2017/programbook.pdf
imec.availabilityPublished - open access


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