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Microfluidics on 200mm quartz substrate using semiconductor fab dry etch process as an enabler for imaging applications in life sciences

dc.contributor.authorStassen, Andim
dc.contributor.authorFiorentino, Giuseppe
dc.contributor.authorJones, Ben
dc.contributor.authorStahl, Richard
dc.contributor.authorDupont, Tania
dc.contributor.authorVrancken, Evi
dc.contributor.authorHumbert, Aurelie
dc.contributor.authorSeveri, Simone
dc.contributor.authorWood, Alex
dc.contributor.authorWorster, Will
dc.contributor.authorRiddell, Kevin
dc.contributor.authorAshraf, Huma
dc.contributor.authorThomas, Dave
dc.date.accessioned2021-10-24T14:09:34Z
dc.date.available2021-10-24T14:09:34Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29496
dc.sourceIIOimport
dc.titleMicrofluidics on 200mm quartz substrate using semiconductor fab dry etch process as an enabler for imaging applications in life sciences
dc.typeMeeting abstract
dc.contributor.imecauthorStassen, Andim
dc.contributor.imecauthorFiorentino, Giuseppe
dc.contributor.imecauthorJones, Ben
dc.contributor.imecauthorStahl, Richard
dc.contributor.imecauthorDupont, Tania
dc.contributor.imecauthorVrancken, Evi
dc.contributor.imecauthorHumbert, Aurelie
dc.contributor.imecauthorSeveri, Simone
dc.contributor.orcidimecStassen, Andim::0000-0001-8819-9592
dc.contributor.orcidimecHumbert, Aurelie::0000-0002-2538-8991
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpagePO145
dc.source.conferenceMicro Nano Engineering 2017
dc.source.conferencedate18/09/2017
dc.source.conferencelocationBraga Portugal
imec.availabilityPublished - open access


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