Improvement of the focus-exposure latitude using optimised illumination and mask design

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Authors
Pforr, Rainer; Ronse, Kurt; Jaenen, Patrick; Jonckheere, Rik; Van den hove, Luc; van Oorschot, P.; Luehrman, P.
Conference
Optical/Laser Microlithography VII
Title
Improvement of the focus-exposure latitude using optimised illumination and mask design
Publication type
Proceedings paper
Embargo date
9999-12-31
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