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Growth inhibition of metal oxide ALD on advanced patterning film (APF) for tone reversal of HfO2 and TiO2 patterned structures

dc.contributor.authorStevens, Eric
dc.contributor.authorTomczak, Yoann
dc.contributor.authorChan, BT
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorDelabie, Annelies
dc.contributor.authorParsons, Gregory
dc.date.accessioned2021-10-24T14:16:11Z
dc.date.available2021-10-24T14:16:11Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29506
dc.sourceIIOimport
dc.titleGrowth inhibition of metal oxide ALD on advanced patterning film (APF) for tone reversal of HfO2 and TiO2 patterned structures
dc.typeProceedings paper
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conference17th International Conference on Atomic Layer Deposition - ALD
dc.source.conferencedate15/07/2017
dc.source.conferencelocationDenver, CO USA
dc.identifier.urlhttps://www.researchgate.net/publication/318561942_Growth_Inhibition_of_Metal_Oxide_ALD_on_Advanced_Patterning_Film_APF_for_Tone
imec.availabilityPublished - open access


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