dc.contributor.author | Timmermans, Marina | |
dc.contributor.author | Pollentier, Ivan | |
dc.contributor.author | Lee, Jae Uk | |
dc.contributor.author | Meersschaut, Johan | |
dc.contributor.author | Richard, Olivier | |
dc.contributor.author | Adelmann, Christoph | |
dc.contributor.author | Huyghebaert, Cedric | |
dc.contributor.author | Gallagher, Emily | |
dc.date.accessioned | 2021-10-24T15:05:40Z | |
dc.date.available | 2021-10-24T15:05:40Z | |
dc.date.issued | 2017 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/29585 | |
dc.source | IIOimport | |
dc.title | CNT EUV pellicle:moving towards a full-size solution | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Timmermans, Marina | |
dc.contributor.imecauthor | Pollentier, Ivan | |
dc.contributor.imecauthor | Lee, Jae Uk | |
dc.contributor.imecauthor | Meersschaut, Johan | |
dc.contributor.imecauthor | Richard, Olivier | |
dc.contributor.imecauthor | Adelmann, Christoph | |
dc.contributor.imecauthor | Huyghebaert, Cedric | |
dc.contributor.imecauthor | Gallagher, Emily | |
dc.contributor.orcidimec | Timmermans, Marina::0000-0001-9805-8259 | |
dc.contributor.orcidimec | Pollentier, Ivan::0000-0002-4266-6500 | |
dc.contributor.orcidimec | Lee, Jae Uk::0000-0002-9434-5055 | |
dc.contributor.orcidimec | Meersschaut, Johan::0000-0003-2467-1784 | |
dc.contributor.orcidimec | Richard, Olivier::0000-0002-3994-8021 | |
dc.contributor.orcidimec | Adelmann, Christoph::0000-0002-4831-3159 | |
dc.contributor.orcidimec | Huyghebaert, Cedric::0000-0001-6043-7130 | |
dc.contributor.orcidimec | Gallagher, Emily::0000-0002-2927-8298 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 104510P | |
dc.source.conference | Photomask Technology | |
dc.source.conferencedate | 11/09/2017 | |
dc.source.conferencelocation | Monterey, CA USA | |
dc.identifier.url | http://spie.org/Publications/Proceedings/Paper/10.1117/12.2280632 | |
imec.availability | Published - open access | |
imec.internalnotes | Proc. SPIE 10451, Photomask Technology, 104510P (16 October 2017); doi: 10.1117/12.2280632 Show Author Affiliations Proceedings of SPIE; Vol. 10451 Published in SPIE Proceedings Vol. 10451: Photomask Technology | |