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WS2 chemical vapor deposition with WF6 and H2S: influence of the substrate

dc.contributor.authorTomczak, Yoann
dc.contributor.authorGroven, Benjamin
dc.contributor.authorCaymax, Matty
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorRadu, Iuliana
dc.contributor.authorDelabie, Annelies
dc.date.accessioned2021-10-24T15:08:31Z
dc.date.available2021-10-24T15:08:31Z
dc.date.issued2017
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29590
dc.sourceIIOimport
dc.titleWS2 chemical vapor deposition with WF6 and H2S: influence of the substrate
dc.typeMeeting abstract
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorGroven, Benjamin
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorRadu, Iuliana
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.orcidimecGroven, Benjamin::0000-0002-5781-7594
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.contributor.orcidimecRadu, Iuliana::0000-0002-7230-7218
dc.source.peerreviewyes
dc.source.conferenceJoint EuroCVD - Baltic ALD
dc.source.conferencedate11/06/2017
dc.source.conferencelocationLinkoping Sweden
imec.availabilityPublished - imec


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