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Improvement of the focus-exposure latitude using optimised illumination and mask design

dc.contributor.authorPforr, Rainer
dc.contributor.authorRonse, Kurt
dc.contributor.authorJaenen, Patrick
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan den hove, Luc
dc.contributor.authorvan Oorschot, P.
dc.contributor.authorLuehrman, P.
dc.date.accessioned2021-09-29T12:45:22Z
dc.date.available2021-09-29T12:45:22Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/295
dc.sourceIIOimport
dc.titleImprovement of the focus-exposure latitude using optimised illumination and mask design
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorJaenen, Patrick
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage65
dc.source.endpage83
dc.source.conferenceOptical/Laser Microlithography VII
dc.source.conferencedate23/03/1994
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 2197


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