Wafer shape based in-plane distortion predictions using superfast 4G metrology

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Authors
Van Dijk, Leon; Mileham, Jeffrey; Malakhovsky, Ilja; Laidler, David; Dekkers, Harold; Van Elshocht, Sven; Anberg, Doug; Owen, David M.; van Haren, Richard
DOI
10.1117/12.2257475
Conference
Metrology, Inspection, and Process Control for Microlithography XXXI,
Title
Wafer shape based in-plane distortion predictions using superfast 4G metrology
Publication type
Proceedings paper
Embargo date
9999-12-31
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