ALD as an enabler of self-aligned multiple patterning schemes

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Authors
Van Elshocht, Sven; Tao, Zheng; Everaert, Jean-Luc; Demuynck, Steven; Altamirano Sanchez, Efrain
Conference
AVS 17th International Conference on Atomic Layer Deposition - ALD
Title
ALD as an enabler of self-aligned multiple patterning schemes
Publication type
Proceedings paper
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