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A new HF vapor native oxide removal process for cluster applications
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Authors
Sprey, Hessel
;
Storm, Arjen
;
Maes, Jan
;
Granneman, E. H. A.
;
Hendriks, Marton
;
Röhr, Erika
;
Caymax, Matty
;
Decoutere, Stefaan
;
Heyns, Marc
Conference
Proceedings of the Symposium on Contamination Free Manufacturing for Semiconductor Manufacturing; SEMICON West
Title
A new HF vapor native oxide removal process for cluster applications
Publication type
Proceedings paper
Embargo date
9999-12-31
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