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A new HF vapor native oxide removal process for cluster applications

dc.contributor.authorSprey, Hessel
dc.contributor.authorStorm, Arjen
dc.contributor.authorMaes, Jan
dc.contributor.authorGranneman, E. H. A.
dc.contributor.authorHendriks, Marton
dc.contributor.authorRöhr, Erika
dc.contributor.authorCaymax, Matty
dc.contributor.authorDecoutere, Stefaan
dc.contributor.authorHeyns, Marc
dc.date.accessioned2021-10-01T09:00:05Z
dc.date.available2021-10-01T09:00:05Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2968
dc.sourceIIOimport
dc.titleA new HF vapor native oxide removal process for cluster applications
dc.typeProceedings paper
dc.contributor.imecauthorSprey, Hessel
dc.contributor.imecauthorMaes, Jan
dc.contributor.imecauthorCaymax, Matty
dc.contributor.imecauthorDecoutere, Stefaan
dc.contributor.imecauthorHeyns, Marc
dc.contributor.orcidimecDecoutere, Stefaan::0000-0001-6632-6239
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpageJ1
dc.source.endpageJ10
dc.source.conferenceProceedings of the Symposium on Contamination Free Manufacturing for Semiconductor Manufacturing; SEMICON West
dc.source.conferencedate13/07/1998
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access


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