dc.contributor.author | Steegen, An | |
dc.contributor.author | De Wolf, Ingrid | |
dc.contributor.author | Bender, Hugo | |
dc.contributor.author | Maex, Karen | |
dc.date.accessioned | 2021-10-01T09:01:00Z | |
dc.date.available | 2021-10-01T09:01:00Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/2972 | |
dc.source | IIOimport | |
dc.title | Local mechanical stress induced during Ti- and Co/Ti silicidation reaction in sub-0.25 µm MOS technologies | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | De Wolf, Ingrid | |
dc.contributor.imecauthor | Bender, Hugo | |
dc.contributor.imecauthor | Maex, Karen | |
dc.contributor.orcidimec | De Wolf, Ingrid::0000-0003-3822-5953 | |
dc.source.peerreview | no | |
dc.source.conference | Workshop on Nanoscale Characterization of Silicide/Semiconductor Contacts by Scanning Probe Microscopy; 24 Sept. 1998; Gent, Bel | |
dc.source.conferencelocation | | |
imec.availability | Published - imec | |