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Local mechanical stress induced defects for Ti and Co/Ti silicidation in sub-0.25μm MOS-technologies

dc.contributor.authorSteegen, An
dc.contributor.authorMaex, Karen
dc.contributor.authorDe Wolf, Ingrid
dc.date.accessioned2021-10-01T09:01:25Z
dc.date.available2021-10-01T09:01:25Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2974
dc.sourceIIOimport
dc.titleLocal mechanical stress induced defects for Ti and Co/Ti silicidation in sub-0.25μm MOS-technologies
dc.typeProceedings paper
dc.contributor.imecauthorMaex, Karen
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage200
dc.source.endpage201
dc.source.conferenceIEEE VLSI Technology Symposium
dc.source.conferencedate9/06/1998
dc.source.conferencelocationHonolulu, HI USA
imec.availabilityPublished - imec


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