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Resist surface investigations for reduction of line-edge-roughness in surface imaging technology

dc.contributor.authorSugihara, Takashi
dc.contributor.authorVan Roey, Frieda
dc.contributor.authorGoethals, Mieke
dc.contributor.authorRonse, Kurt
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-10-01T09:04:44Z
dc.date.available2021-10-01T09:04:44Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2990
dc.sourceIIOimport
dc.titleResist surface investigations for reduction of line-edge-roughness in surface imaging technology
dc.typeOral presentation
dc.contributor.imecauthorVan Roey, Frieda
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVan den hove, Luc
dc.source.peerreviewno
dc.source.conferenceMNE 98 - Micro- and Nano-Engineering Conference; 22-24 Sept. 1998; Leuven, Belgium.
dc.source.conferencelocation
imec.availabilityPublished - imec


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