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Strained germanium gate-all-around PMOS device demonstration using selective wire release etch prior to replacement metal gate deposition

dc.contributor.authorWitters, Liesbeth
dc.contributor.authorSebaai, Farid
dc.contributor.authorHikavyy, Andriy
dc.contributor.authorMilenin, Alexey
dc.contributor.authorLoo, Roger
dc.contributor.authorDe Keersgieter, An
dc.contributor.authorEneman, Geert
dc.contributor.authorSchram, Tom
dc.contributor.authorWostyn, Kurt
dc.contributor.authorDevriendt, Katia
dc.contributor.authorSchulze, Andreas
dc.contributor.authorLieten, Ruben
dc.contributor.authorBilodeau, S
dc.contributor.authorCooper, E
dc.contributor.authorStorck, Peter
dc.contributor.authorVrancken, Christa
dc.contributor.authorArimura, Hiroaki
dc.contributor.authorFavia, Paola
dc.contributor.authorVancoille, Eric
dc.contributor.authorMitard, Jerome
dc.contributor.authorLanger, Robert
dc.contributor.authorOpdebeeck, Ann
dc.contributor.authorHolsteyns, Frank
dc.contributor.authorWaldron, Niamh
dc.contributor.authorBarla, Kathy
dc.contributor.authorDe Heyn, Vincent
dc.contributor.authorMocuta, Dan
dc.contributor.authorCollaert, Nadine
dc.date.accessioned2021-10-24T19:05:03Z
dc.date.available2021-10-24T19:05:03Z
dc.date.issued2017-06
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/29945
dc.sourceIIOimport
dc.titleStrained germanium gate-all-around PMOS device demonstration using selective wire release etch prior to replacement metal gate deposition
dc.typeProceedings paper
dc.contributor.imecauthorWitters, Liesbeth
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorHikavyy, Andriy
dc.contributor.imecauthorMilenin, Alexey
dc.contributor.imecauthorLoo, Roger
dc.contributor.imecauthorDe Keersgieter, An
dc.contributor.imecauthorEneman, Geert
dc.contributor.imecauthorSchram, Tom
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorLieten, Ruben
dc.contributor.imecauthorVrancken, Christa
dc.contributor.imecauthorArimura, Hiroaki
dc.contributor.imecauthorFavia, Paola
dc.contributor.imecauthorVancoille, Eric
dc.contributor.imecauthorMitard, Jerome
dc.contributor.imecauthorLanger, Robert
dc.contributor.imecauthorOpdebeeck, Ann
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.imecauthorWaldron, Niamh
dc.contributor.imecauthorBarla, Kathy
dc.contributor.imecauthorDe Heyn, Vincent
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecHikavyy, Andriy::0000-0002-8201-075X
dc.contributor.orcidimecMilenin, Alexey::0000-0003-0747-0462
dc.contributor.orcidimecLoo, Roger::0000-0003-3513-6058
dc.contributor.orcidimecDe Keersgieter, An::0000-0002-5527-8582
dc.contributor.orcidimecEneman, Geert::0000-0002-5849-3384
dc.contributor.orcidimecSchram, Tom::0000-0003-1533-7055
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecFavia, Paola::0000-0002-1019-3497
dc.contributor.orcidimecMitard, Jerome::0000-0002-7422-079X
dc.contributor.orcidimecLanger, Robert::0000-0002-1132-3468
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.source.peerreviewyes
dc.source.beginpage194
dc.source.endpage195
dc.source.conferenceSymposium on VLSI Technology
dc.source.conferencedate5/06/2017
dc.source.conferencelocationKyoto Japan
dc.identifier.urlhttp://ieeexplore.ieee.org/document/7998168/
imec.availabilityPublished - imec


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