Show simple item record

Evolution of roughness during the pattern transfer of high-chi, 10 nm half-pitch, silicon-containing block copolymer structures

dc.contributor.authorBlachut, Gregory
dc.contributor.authorSirard, Stephen
dc.contributor.authorLiang, Andrew
dc.contributor.authorMack, Chris
dc.contributor.authorMaher, Michael
dc.contributor.authorRincon Delgadillo, Paulina
dc.contributor.authorChan, BT
dc.contributor.authorMannaert, Geert
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorWillson, Grant
dc.contributor.authorEllison, Christopher
dc.contributor.authorHymes, Diane
dc.date.accessioned2021-10-25T16:45:58Z
dc.date.available2021-10-25T16:45:58Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30258
dc.sourceIIOimport
dc.titleEvolution of roughness during the pattern transfer of high-chi, 10 nm half-pitch, silicon-containing block copolymer structures
dc.typeProceedings paper
dc.contributor.imecauthorRincon Delgadillo, Paulina
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorMannaert, Geert
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1058907
dc.source.conferenceAdvanced Etch Technology for Nanopatterning VII
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2297489
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10589


Files in this item

Thumbnail
Name:
38699.pdf
Size:
623.9Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record