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Effects on IC quality of 5X reticle repair using FIB with stain reduction

dc.contributor.authorPrewett, P. D.
dc.contributor.authorMartin, B.
dc.contributor.authorWatson, J. G.
dc.contributor.authorJonckheere, Rik
dc.date.accessioned2021-09-29T12:45:37Z
dc.date.available2021-09-29T12:45:37Z
dc.date.issued1994
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/302
dc.sourceIIOimport
dc.titleEffects on IC quality of 5X reticle repair using FIB with stain reduction
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage211
dc.source.endpage218
dc.source.conferenceIntegrated Circuit Metrology, Inspection and Process Control VIII
dc.source.conferencedate28/02/1994
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 2196


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