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A method to pattern tight tip-to-tip in 32nm-pitch N5 interconnect using Ru area selective deposition tone inversion process

dc.contributor.authorBriggs, Basoene
dc.contributor.authorSoethoudt, Job
dc.contributor.authorDelabie, Annelies
dc.contributor.authorWilson, Chris
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBoemmels, Juergen
dc.contributor.authorDevriendt, Katia
dc.contributor.authorSebaai, Farid
dc.contributor.authorLorant, Christophe
dc.contributor.authorHody, Hubert
dc.date.accessioned2021-10-25T16:56:53Z
dc.date.available2021-10-25T16:56:53Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30328
dc.sourceIIOimport
dc.titleA method to pattern tight tip-to-tip in 32nm-pitch N5 interconnect using Ru area selective deposition tone inversion process
dc.typeOral presentation
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBoemmels, Juergen
dc.contributor.imecauthorDevriendt, Katia
dc.contributor.imecauthorSebaai, Farid
dc.contributor.imecauthorLorant, Christophe
dc.contributor.imecauthorHody, Hubert
dc.contributor.orcidimecDevriendt, Katia::0000-0002-0662-7926
dc.contributor.orcidimecLorant, Christophe::0000-0001-7363-9348
dc.source.peerreviewno
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM
dc.source.conferencedate18/03/2018
dc.source.conferencelocationMilano Italy
dc.identifier.urlhttp://mam2018.mdm.imm.cnr.it/MAM2018.pdf
imec.availabilityPublished - imec
imec.internalnotesP22


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