Defect avoidance for extreme-ultraviolet mask defects using intentional pattern deformation

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Authors
Chae, Yoo-jin; Jonckheere, Rik; Gupta, Puneet
Conference
International Conference on Extreme Ultraviolet Lithography
Title
Defect avoidance for extreme-ultraviolet mask defects using intentional pattern deformation
Publication type
Proceedings paper
Embargo date
9999-12-31
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