dc.contributor.author | Constantoudis, Vassilios | |
dc.contributor.author | Papavieros, George | |
dc.contributor.author | Lorusso, Gian | |
dc.contributor.author | Rutigliani, Vito | |
dc.contributor.author | Van Roey, Frieda | |
dc.contributor.author | Gogolides, Evangelos | |
dc.date.accessioned | 2021-10-25T17:25:06Z | |
dc.date.available | 2021-10-25T17:25:06Z | |
dc.date.issued | 2018 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/30458 | |
dc.source | IIOimport | |
dc.title | Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transfer | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Lorusso, Gian | |
dc.contributor.imecauthor | Van Roey, Frieda | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 105890Y | |
dc.source.conference | Advanced Etch Technology for Nanopatterning VII | |
dc.source.conferencedate | 25/02/2018 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | https://doi.org/10.1117/12.2306282 | |
imec.availability | Published - open access | |
imec.internalnotes | Proceedings of SPIE; Vol. 10589 | |