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State-of-the-art of EUV materials for N5 logic and DRAM applications

dc.contributor.authorDe Simone, Danilo
dc.contributor.authorVesters, Yannick
dc.contributor.authorVanelderen, Pieter
dc.contributor.authorXue, Ran
dc.contributor.authorPollentier, Ivan
dc.contributor.authorVandenberghe, Geert
dc.date.accessioned2021-10-25T17:50:20Z
dc.date.available2021-10-25T17:50:20Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30555
dc.sourceIIOimport
dc.titleState-of-the-art of EUV materials for N5 logic and DRAM applications
dc.typeProceedings paper
dc.contributor.imecauthorDe Simone, Danilo
dc.contributor.imecauthorVanelderen, Pieter
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.orcidimecDe Simone, Danilo::0000-0003-3927-5207
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage108090U
dc.source.conferenceInternational Conference on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate16/09/2018
dc.source.conferencelocationMonterey, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2502915
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10809


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