Show simple item record

Exploration of BEOL line-space patterning options at 12nm half-pitch and below

dc.contributor.authorDecoster, Stefan
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorPetersen Barbosa Lima, Lucas
dc.contributor.authorLi, Waikin
dc.contributor.authorVersluijs, Janko
dc.contributor.authorHalder, Sandip
dc.contributor.authorMallik, Arindam
dc.contributor.authorMurdoch, Gayle
dc.date.accessioned2021-10-25T17:55:38Z
dc.date.available2021-10-25T17:55:38Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30573
dc.sourceIIOimport
dc.titleExploration of BEOL line-space patterning options at 12nm half-pitch and below
dc.typeProceedings paper
dc.contributor.imecauthorDecoster, Stefan
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorPetersen Barbosa Lima, Lucas
dc.contributor.imecauthorLi, Waikin
dc.contributor.imecauthorVersluijs, Janko
dc.contributor.imecauthorHalder, Sandip
dc.contributor.imecauthorMallik, Arindam
dc.contributor.imecauthorMurdoch, Gayle
dc.contributor.orcidimecDecoster, Stefan::0000-0003-1162-9288
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecHalder, Sandip::0000-0002-6314-2685
dc.contributor.orcidimecMallik, Arindam::0000-0002-0742-9366
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage105890E
dc.source.conferenceAdvanced Etch Technology for Nanopatterning VII
dc.source.conferencedate25/02/2018
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttps://doi.org/10.1117/12.2297183
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 10589


Files in this item

Thumbnail
Name:
36928.pdf
Size:
3.531Mb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record