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Area selective atomic layer deposition: a bottom-up approach for patterning

dc.contributor.authorDelabie, Annelies
dc.contributor.authorSoethoudt, Job
dc.contributor.authorTomczak, Yoann
dc.contributor.authorBriggs, Basoene
dc.contributor.authorChan, BT
dc.contributor.authorTokei, Zsolt
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorStevens, Eric
dc.contributor.authorParsons, Gregory, N
dc.date.accessioned2021-10-25T17:59:27Z
dc.date.available2021-10-25T17:59:27Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30586
dc.sourceIIOimport
dc.titleArea selective atomic layer deposition: a bottom-up approach for patterning
dc.typeMeeting abstract
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorSoethoudt, Job
dc.contributor.imecauthorTomczak, Yoann
dc.contributor.imecauthorBriggs, Basoene
dc.contributor.imecauthorChan, BT
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.orcidimecChan, BT::0000-0003-2890-0388
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpage02K
dc.source.conferenceMaterials for Advanced Metallization Conference - MAM
dc.source.conferencedate18/03/2018
dc.source.conferencelocationMilan Italy
dc.identifier.urlhttp://mam2018.mdm.imm.cnr.it/MAM2018.pdf
imec.availabilityPublished - imec
imec.internalnotesKeynote


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