A ballistic electron-emission microscopy (BEEM)-investigation of the effects of chemical pretreatments on III-V semiconductor Schottky barriers
dc.contributor.author | Van Meirhaeghe, R. | |
dc.contributor.author | Vanalme, G. | |
dc.contributor.author | Goubert, L. | |
dc.contributor.author | Cardon, F. | |
dc.contributor.author | Van Daele, P. | |
dc.date.accessioned | 2021-10-01T09:22:04Z | |
dc.date.available | 2021-10-01T09:22:04Z | |
dc.date.issued | 1998 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/3062 | |
dc.source | IIOimport | |
dc.title | A ballistic electron-emission microscopy (BEEM)-investigation of the effects of chemical pretreatments on III-V semiconductor Schottky barriers | |
dc.type | Oral presentation | |
dc.source.peerreview | no | |
dc.source.conference | MRS Spring Meeting 1998. Symposium S: Nanoscale Characterization Using Scanning Probes; April 13-16, 1998; San Francisco, CA, US | |
dc.source.conferencelocation | ||
imec.availability | Published - imec |
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