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dc.contributor.authorVan Olmen, Jan
dc.contributor.authorManca, Jean
dc.contributor.authorDe Ceuninck, Ward
dc.contributor.authorDe Schepper, Luc
dc.contributor.authorD'Haeger, V.
dc.contributor.authorWitvrouw, Ann
dc.contributor.authorMaex, Karen
dc.date.accessioned2021-10-01T09:22:38Z
dc.date.available2021-10-01T09:22:38Z
dc.date.issued1998
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/3064
dc.sourceIIOimport
dc.titleOverview of the kinetics of the early stages of electromigration under low (=realistic) current density stress
dc.typeProceedings paper
dc.contributor.imecauthorVan Olmen, Jan
dc.contributor.imecauthorDe Ceuninck, Ward
dc.contributor.imecauthorMaex, Karen
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage1009
dc.source.endpage1014
dc.source.conferenceProceedings of the 9th European Symposium on Reliability of Electron Devices and Failure Physics - ESREF
dc.source.conferencedate5/10/1998
dc.source.conferencelocation
imec.availabilityPublished - open access
imec.internalnotesSpecial Issue Microelectronics Reliability 38(1998)


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