Optimization of post etch cobalt compatible clean by pH and oxidizer

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Authors
Iino, H.; Ogawa, Y.; Masaoka, T.; Le, Quoc Toan; Kesters, Els; Rip, Jens; Oniki, Yusuke; Akanishi, Y.; Iwasaki, Akihisa; Holsteyns, Frank
Conference
Ultra Clean Processing of Semiconductor Surfaces XIV - UCPSS
Title
Optimization of post etch cobalt compatible clean by pH and oxidizer
Publication type
Proceedings paper
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