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Optimization of post etch cobalt compatible clean by pH and oxidizer

dc.contributor.authorIino, H.
dc.contributor.authorOgawa, Y.
dc.contributor.authorMasaoka, T.
dc.contributor.authorLe, Quoc Toan
dc.contributor.authorKesters, Els
dc.contributor.authorRip, Jens
dc.contributor.authorOniki, Yusuke
dc.contributor.authorAkanishi, Y.
dc.contributor.authorIwasaki, Akihisa
dc.contributor.authorHolsteyns, Frank
dc.date.accessioned2021-10-25T20:08:23Z
dc.date.available2021-10-25T20:08:23Z
dc.date.issued2018
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/30934
dc.sourceIIOimport
dc.titleOptimization of post etch cobalt compatible clean by pH and oxidizer
dc.typeProceedings paper
dc.contributor.imecauthorLe, Quoc Toan
dc.contributor.imecauthorKesters, Els
dc.contributor.imecauthorRip, Jens
dc.contributor.imecauthorOniki, Yusuke
dc.contributor.imecauthorHolsteyns, Frank
dc.contributor.orcidimecLe, Quoc Toan::0000-0002-0206-6279
dc.contributor.orcidimecOniki, Yusuke::0000-0002-6619-1327
dc.source.peerreviewyes
dc.source.beginpage268
dc.source.endpage272
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XIV - UCPSS
dc.source.conferencedate2/09/2018
dc.source.conferencelocationLeuven Belgium
dc.identifier.urlhttps://www.scientific.net/SSP.282.268
imec.availabilityPublished - imec
imec.internalnotesSolid State Phenomena; Vol. 282


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