dc.contributor.author | Iino, H. | |
dc.contributor.author | Ogawa, Y. | |
dc.contributor.author | Masaoka, T. | |
dc.contributor.author | Le, Quoc Toan | |
dc.contributor.author | Kesters, Els | |
dc.contributor.author | Rip, Jens | |
dc.contributor.author | Oniki, Yusuke | |
dc.contributor.author | Akanishi, Y. | |
dc.contributor.author | Iwasaki, Akihisa | |
dc.contributor.author | Holsteyns, Frank | |
dc.date.accessioned | 2021-10-25T20:08:23Z | |
dc.date.available | 2021-10-25T20:08:23Z | |
dc.date.issued | 2018 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/30934 | |
dc.source | IIOimport | |
dc.title | Optimization of post etch cobalt compatible clean by pH and oxidizer | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | Le, Quoc Toan | |
dc.contributor.imecauthor | Kesters, Els | |
dc.contributor.imecauthor | Rip, Jens | |
dc.contributor.imecauthor | Oniki, Yusuke | |
dc.contributor.imecauthor | Holsteyns, Frank | |
dc.contributor.orcidimec | Le, Quoc Toan::0000-0002-0206-6279 | |
dc.contributor.orcidimec | Oniki, Yusuke::0000-0002-6619-1327 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 268 | |
dc.source.endpage | 272 | |
dc.source.conference | Ultra Clean Processing of Semiconductor Surfaces XIV - UCPSS | |
dc.source.conferencedate | 2/09/2018 | |
dc.source.conferencelocation | Leuven Belgium | |
dc.identifier.url | https://www.scientific.net/SSP.282.268 | |
imec.availability | Published - imec | |
imec.internalnotes | Solid State Phenomena; Vol. 282 | |